gas mixer / static / batch / process
ISO 9001, API 8C, 18000 RPM, 1500 ml | HMD-400
Vnation JSC

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Type:
static
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Batch/continuous:
batch
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Domain:
process, for the semiconductor industry
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Applications:
for gas
Gas mixer for SEMI-KLEEN and EM-KLEEN series remote plasma source.
SEMI-KLEEN or EM-KLEEN series remote plasma source can only accept one gas input. For some research projects, user may need to mix multiple process gases for SEMI-KLEEN or EM-KLEEN remote plasma source. Three-port gas mixer listed here integrates up to three mass flow controlled gas input ports, one venting/bypass pumping port and one mixed gas output port. The gas output port should be connected to gas input port on the SEMI-KLEEN or EM-KLEEN remote plasma cleaners. Venting/bypass pumping port offers a high conductance pumping route to evacuate gas tubing if high purity gas delivery is required.
Features:
Touchscreen user interface
Up to three mass flow controlled gas input port
Venting/bypassing port for venting chamber and pumping down gas tubing at high speed.
Flow rate compensation for different gas species
Integrated timer
110~230V universal AC power input.